The IMM – Naples Micro/nano Fabrication Clean Room is a multidisciplinary facility dedicated to research and development of nanotechnology, bio-sensing applications, photonic and microelectronic devices.
It’s a 200 sqm ISO 5 / 6 Clean Room equipped with the main technologies for micro and nano scale devices fabrication. Inside it is present an ultra-pure water system, a chemical storage box, a semiconductor grade Gas N2 and vacuum distribution system. Outsise, in the external thecnical room, there are the ultra pure gas boxes, a bi-osmotic water production system and a water cooling system to service all the technological systems inside the Clean Room.
This laboratory supports the research activities of the IMM – Naples scientific group, allows the scientific collaboration with international high-tech industries and houses Ph.D students and Post-Doc from the most important national and international universities.
The Clean Room is organized in 5 different technological areas, each dedicated to a specific processing applications.
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GROWTH, DEPOSITION AND THERMAL PROCESSES
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WET AND DRY ETCHING
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This technological area is mainly dedicated to etching processes, wet and dry, of the materials. The dry etching equipment includes two different RIE system, an HV ICP-RIE for high aspect ratio etching and a RIE system for standard etching processes and for surface treatment. This laboratory is utilized also for the pre-processing substrate cleaning, with wet chemical benches for standard RCA procedure and/or for post-processing wet chemical etching. This lab includes also a cell for electrochemical etching of silicon dedicated to porous silicon fabrication and a flow laminar bench for the fabrication of microfluidic chips PDMS based
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OPTICAL AND LASER LITHOGRAPHY
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NANOLITHOGRAPHY
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